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Short Courses

Short Courses cover a broad range of topic areas at a variety of educational levels (introductory to advanced). The courses are taught by highly regarded industry experts in a variety of specialties. Short Courses are an excellent opportunity to learn about new products, cutting-edge technology and vital information at the forefront of your field.  They are designed to increase your knowledge of a specific subject while offering you the experience of knowledgeable teachers.

Certificate of Attendances are available for those who register and attend a course.  To request a Certificate of Attendance after the conference, please email cstech@osa.org with your name, the course name, conference name, and year.

 

Registration

Each Short Course requires a separate fee. Paid registration includes admission to the course and one copy of the Short Course Notes. Advance registration is advisable. The number of seats in each course is limited, and on-site registration is not guaranteed.

Short Courses Schedule

Sunday, 14 October, 9:00-12:30

SC182 - Biomedical Optical Diagnostics and Sensing - CANCELED
SC306 - Exploring Optical Aberrations
SC324 - Plasmonics - CANCELED
SC366 - Coherence and Optical Imaging - CANCELED

Sunday, 14 October, 13:30-17:00

SC189 - Photonic Quantum-Enhanced Technologies
SC235 - Nanophotonics: Design, Fabrication and Characterization
SC302 - MetaMaterials - CANCELED

Short Courses Descriptions

SC182: Biomedical Optical Diagnostics and Sensing - CANCELED

Sunday, 14 October 2012,  9:00  - 12:30
Instructor:  Sebastian Wachsmann-Hogiu, Univ. of California Davis, USA
 

SC306 Exploring Optical Aberrations

Sunday, 14 October 2012, 9:00  - 12:30
Instructor:  Virendra N. Mahajan, Aerospace Corp., USA

Description:
The quality of an optical system is determined by its aberrations. This course will explore the effect of aberrations on image quality. Starting with basic aberrations of optical systems, we will discuss how they affect central irradiance on a target, energy on a detector, and line of sight and resolution of a system. The importance of the use of Zernike polynomials in optical testing and design, spot diagrams in optical system analysis, and Strehl ratio for aberration tolerance will be covered. The chromatic aberrations and the polychromatic PSF and OTF will be explained.

Benefits and Learning Objectives:
This course should enable participants to:

  • Acquire a working knowledge of aberrations and their effect on energy on detector, line of sight error and MTF.
  • Determine aberration tolerance based on Strehl ratio and Rayleigh’s quarter wave rule.
  • Specify fabrication and assembly errors based on a certain aberration tolerance.
  • Understand the significance and use of the Zernike polynomials in optical design and testing.
  • Develop an effective working interface between system engineers/engineering managers and optical designers.
  • Communicate effectively with optical engineers and designers.

Audience:
Anyone interested in acquiring a working knowledge of aberrations. Those who have a background in lens and optical system design or optical testing will also benefit from this course. Managers and system engineers will learn to communicate effectively with optical engineers and designers.

Instructor Biography:
Virendra (Vini) N. Mahajan, Ph.D., is a graduate of the College of Optical Sciences, University of Arizona, where he is an adjunct professor teaching courses on aberrations. He has 33 years of experience working on space optical systems, the last 25 with Aerospace Corp. He is a Fellow of OSA, SPIE and the Optical Society of India, and the winner of SPIE’s 2006 Conrady award. He is the author of Aberration Theory Made Simple (1991), the editor of Selected Papers on Effects of Aberrations in Optical Imaging (1993), and the author of Optical Imaging and Aberrations, Part I: Ray Geometrical Optics (1998) and Part II: Wave Diffraction Optics (2001), all published by SPIE Press. He is also an associate editor of OSA’s Handbook of Optics in the area of classical optics.

SC324 Plasmonics - CANCELED

Sunday, 14 October 2012, 9:00  - 12:30
Instructor: Javier Aizpurua, Spanish Council for Scientific Research CSIC-UPV/EHU and Donostia International Physics Center DIPC, Spain
 

SC366 Coherence and Optical Imaging - CANCELED

Sunday, 14 October 2012, 9:00  - 12:30
Instructor: Thomas Brown; Univ. of Rochester, USA
 

SC189 Photonic Quantum-Enhanced Technologies

Sunday, 14 October 2012, 13:30-17:00
Instructor: Ian Walmsley; Univ. of Oxford, UK

Description:
This course will provide a tutorial overview of the sorts of enhancements that quantum physics can provide for technology, and a short survey of applications and potential applications. These will include quantum interferometry and metrology, microscopy, communications, cryptography, frequency standards and clock synchronization, as well as computation and information processing. The rudiments of quantum mechanics needed to understand the technology will be covered, focusing particularly on quantum interference and entanglement in optics, as well as laboratory measurement methods.

The ideas concerning the application of these principles to the enhancement of important technologies will then be discussed. One of the critical issues in this area is how to design schemes that are robust with respect to unavoidable environmental noise. The critical practical issues that confront real-world implementation of these concepts are many, and important performance parameters that might limit the utility of quantum-enhanced technologies will also be examined.

Benefits:
This course should enable you to:

  • Understand some basic ideas of quantum mechanics relevant to technology.
  • Describe key issues related to several classes of applications.
  • Explain fundamentals of the technological applications that can benefit from quantum enhancement.
  • Discuss the limitations to performance.
  • Follow the progress of the field in the future.

Audience:
The course is intended for those would like to gain a basic understanding of the ways and means by which quantum mechanics can be used to enhance technologies that are critical to the modern world. Some knowledge (a college course at an intermediate level) of quantum mechanical concepts and optics is recommended.

Instructor Biography:
Ian Walmsley is the Hooke Professor of Experimental Physics and Pro-Vice Chancellor for Research at the University of Oxford. He was educated at Imperial College, University of London, and the Institute of Optics, University of Rochester. His research is in the area of quantum optics and quantum control, using the tools of ultrafast optics.

SC235 Nanophotonics: Design, Fabrication and Characterization

Sunday, 14 October 2012  13:30 – 17:00
Instructors: Joseph W. Haus, Univ. of Dayton, USA

Description:
Nanophotonics is an emerging multidisciplinary field that deals with optics on the nanoscale. Recent progress in nanophotonics has created new and exciting technological opportunities. The interaction of light with nanoscale matter can provide greater functionality for photonic devices and render unique information about their structural and dynamical properties.  This nanophotonics course examines the key issues of optics on the nanometer scale. The course covers novel materials, such as photonic crystals, quantum dots, plasmonics, and metamaterials and their applications; it then identifies and explains selected fabrication and synthesis techniques. Photonic devices that exploit nanoscale effects, such as nonlinear optical effects and quantum confinement, will be discussed. Finally, various nanocharacterization techniques used in metrology, nondestructive evaluation and biomedical applications will be explained.

Benefits and Learning Objectives:
This course will enable the participants to:

  • Explain the basic linear and nonlinear optical properties of photonic crystals, metals and metamaterials.
  • Learn how nanoscale effects are exploited in photonic devices.
  • Discuss nanofabrication and design tools.
  • Learn the principles of nanocharacterization tools.
  • Describe computational and modeling techniques used in nanophotonics.
  • Identify the latest advances in the field of nanophotonics.

Audience:
This course is intended for optics professionals who are interested in learning the fundamentals of nanoscale materials and light-matter interactions, nanophotonic devices, fabrication, synthesis and nanocharacterization techniques

Instructor Biography:
Joseph W. Haus is professor and director of the Electro-Optics Program at the Univ. of Dayton. He is an OSA, APS and SPIE fellow. His current research is concentrated on the linear and nonlinear optical properties of heterogeneous materials, especially pulse propagation and nonlinear effects in metamaterials and metallodieletrics, coherent laser radar imaging, and coherent light sources from THz to UV based on electromagnetic parametric conversion and resonance effects.

SC302: MetaMaterials - CANCELED

Sunday, 14 October 2012,  13:30 - 17:00
Instructor: Vladimir M. Shalaev, Purdue Univ., USA