• Technical Conference & Virtual Exhibits:  14 – 17 September 2020
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GRIN Antireflection Layer Manufacture by Periodic Nanostructure Stacking Technology (JW6A.19)

Presenter: I-Te Chen, The University of Texas at Austin

The demonstration of the stacking technology of transparent nanolattices as a potential application as a gradient-index antireflection medium.

Authors:I-Te Chen, The University of Texas at Austin / Chih-Hao Chang, The University of Texas at Austin / Gregory Parsons, North Carolina State University / Zinjin Dai, North Carolina State University


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